Machine Learning-Based Modelling in Atomic Layer Deposition Processes

Discover the groundbreaking insights in "Machine Learning-Based Modelling in Atomic Layer Deposition Processes" by Oluwatobi Adeleke, published by Taylor & Francis Ltd in 2023. This comprehensive hardback spans 354 pages and delves into the innovative application of machine learning techniques in atomic layer deposition (ALD). The book meticulously explores various modelling approaches, offering detailed information on optimization and prediction of ALD behavior and characteristics. Enhance your understanding of how these advanced methodologies can significantly improve process quality control in engineering. Ideal for professionals and researchers alike, this title is a must-have for anyone looking to stay at the forefront of ALD technology.